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1

Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography

Kwon, Gwangmin, Ko, Kyeongkeun, Lee, Haiwon, Lim, Woongsun, Yeom, Geun Young, Lee, Sunwoo, Ahn, Jinho

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2011

Language:

english

File:

PDF, 683 KB

english, 2011

2

Study on contact distortion during high aspect ratio contact SiO2 etching

Kim, Jong Kyu, Lee, Sung Ho, Cho, Sung Il, Yeom, Geun Young

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2015

Language:

english

File:

PDF, 1.27 MB

english, 2015

3

Etching Characteristics and Mechanism of SiNx Films for Nano-Devices in CH2F2/O2/Ar Inductively Coupled Plasma: Effect of O2 Mixing Ratio

Son, Jinyoung, Efremov, Alexander, Yun, Sun Jin, Yeom, Geun Young, Kwon, Kwang-Ho

Journal:

Journal of Nanoscience and Nanotechnology

Year:

2014

Language:

english

File:

PDF, 423 KB

english, 2014

4

Plasma Induced Damage Reduction of Ultra Low-k Dielectric by using Source Pulsed Plasma Etching for Next BEOL Interconnect Manufacturing

Jang, Jun Ki, Tak, Hyun Woo, Shin, Ye Ji, Kim, Doo San, Yeom, Geun Young

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2020

File:

PDF, 3.21 MB

2020

5

Wide-Range Controllable n-Doping of Molybdenum Disulfide (MoS 2 ) through Thermal and Optical Activation

Park, Hyung-Youl, Lim, Myung-Hoon, Jeon, Jeaho, Yoo, Gwangwe, Kang, Dong-Ho, Jang, Sung Kyu, Jeon, Min Hwan, Lee, Youngbin, Cho, Jeong Ho, Yeom, Geun Young, Jung, Woo-Shik, Lee, Jaeho, Park, Seongjun,

Journal:

Year:

2015

Language:

english

File:

PDF, 4.38 MB

english, 2015

6

Effect of source frequency and pulsing on the SiO 2 etching characteristics of dual-frequency capacitive coupled plasma

Kim, Hoe Jun, Jeon, Min Hwan, Mishra, Anurag Kumar, Kim, In Jun, Sin, Tae Ho, Yeom, Geun Young

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 603 KB

english, 2015

7

Very high frequency plasma reactant for atomic layer deposition

Oh, Il-Kwon, Yoo, Gilsang, Yoon, Chang Mo, Kim, Tae Hyung, Yeom, Geun Young, Kim, Kangsik, Lee, Zonghoon, Jung, Hanearl, Lee, Chang Wan, Kim, Hyungjun, Lee, Han-Bo-Ram

Journal:

Applied Surface Science

Year:

2016

Language:

english

File:

PDF, 3.17 MB

english, 2016

8

Etch Damage Reduction of Ultra Low-k Dielectric by Using Pulsed Plasmas

Jang, Jun Ki, Tak, Hyun Woo, Yang, Kyung Chae, Shin, Ye Ji, Hyeon, Jae Young, Kang, Min Guk, Ahn, Jeong Hoon, Yeom, Geun Young

Journal:

ECS Transactions

Year:

2019

Language:

english

File:

PDF, 400 KB

english, 2019

9

Light-emitting characteristics of organic light-emitting diodes with the MoOx-doped NPB and C60/LiF layer

Jae Wook Kwon, Jong Tae Lim, Geun Young Yeom

Journal:

Thin Solid Films

Year:

2010

Language:

english

File:

PDF, 506 KB

english, 2010

10

Photoresist ashing technology using N2/O2ferrite-core ICP in the dual damascene process

Hyoun Woo Kim, Ju Hyun Myung, Jong Woo Lee, Hyung-Sun Kim, Keeho Kim, Jeong-Yeol Jang, Tae-Ho Yoon, Sung Kyeong Kim, Dae-Kyu Choi, Chin-Wook Chung, Geun Young Yeom, Jae-Min Myoung, Hyoung-June Kim

Journal:

Journal of Materials Science

Year:

2006

Language:

english

File:

PDF, 266 KB

english, 2006

11

Atomic layer etching of graphene for full graphene device fabrication

Woong Sun Lim, Yi Yeon Kim, Hyeongkeun Kim, Sukjae Jang, Namyong Kwon, Beyoung Jae Park, Jong-Hyun Ahn, Ilsub Chung, Byung Hee Hong, Geun Young Yeom

Journal:

Year:

2012

Language:

english

File:

PDF, 984 KB

english, 2012

12

Characteristics of the electromagnetic interference shielding effectiveness of Al-doped ZnO thin films deposited by atomic layer deposition

Choi, Yong-June, Gong, Su Cheol, Johnson, David C., Golledge, Stephen, Yeom, Geun Young, Park, Hyung-Ho

Journal:

Applied Surface Science

Year:

2013

Language:

english

File:

PDF, 897 KB

english, 2013

13

On the LPCVD-Formed SiO2Etching Mechanism in CF4/Ar/O2Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas Pressure

Son, Jinyoung, Efremov, Alexander, Chun, Inwoo, Yeom, Geun Young, Kwon, Kwang-Ho

Journal:

Plasma Chemistry and Plasma Processing

Year:

2014

Language:

english

File:

PDF, 540 KB

english, 2014

14

Effect of Capacitor Installed in Series With a Ferrite-Enhanced Internal Linear-Type Antenna on the Properties of an Inductively Coupled Plasma

Gwang Ho Gweon,, Jong Hyeuk Lim,, Seung Pyo Hong,, Geun Young Yeom,

Journal:

IEEE Transactions on Plasma Science

Year:

2010

Language:

english

File:

PDF, 283 KB

english, 2010

15

Characteristics of Internal Inductively Coupled Plasma Source for Ultralarge-Area Plasma Processing

Lim, Jong Hyeuk, Gweon, Gwang Ho, Hong, Seung Pyo, Kim, Kyong Nam, Kim, Yi Yeon, Yeom, Geun Young

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 239 KB

english, 2010

16

Etching of CoFeB Using CO∕NH[sub 3] in an Inductively Coupled Plasma Etching System

Park, Jong-Yoon, Kang, Se-Koo, Jeon, Min-Hwan, Jhon, Myung S., Yeom, Geun-Young

Journal:

Journal of The Electrochemical Society

Year:

2011

Language:

english

File:

PDF, 456 KB

english, 2011

17

Characteristics of Inductively Coupled Plasma using Internal Double Comb-type Antenna for Flat Panel Display Processing

Lim, Jong Hyeuk, Kim, Kyong Nam, Park, Jung Kyun, Park, Jae Hun, Yeom, Geun Young

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 144 KB

english, 2007

18

Atomic layer etching removal of damaged layers in a contact hole for low sheet resistance

Kim, Jong Kyu, Cho, Sung Il, Lee, Sung Ho, Kim, Chan Kyu, Min, Kyung Suk, Yeom, Geun Young

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 1.39 MB

english, 2013

19

Study of selective amorphous silicon etching to silicon nitride using a pin-to-plate dielectric barrier discharge in atmospheric pressure

Kyung, Se-Jin, Park, Jae-Beom, Lee, June-Hee, Lim, Jong-Tae, Yeom, Geun-Young

Journal:

Applied Physics Letters

Year:

2007

Language:

english

File:

PDF, 348 KB

english, 2007

20

Temperature Profile in the Presence of Hotspots in Heat Assisted Magnetic Recording

Kim, Hyung Min, Vemuri, Sesha Hari, Chung, Pil Seung, Jhon, Young In, Lee, Nae-Eung, Yeom, Geun-Young, Jhon, Myung S.

Journal:

IEEE Transactions on Magnetics

Year:

2012

Language:

english

File:

PDF, 456 KB

english, 2012

21

Perfluoropolyether Lubricant Interactions With Novel Overcoat via Coarse-Grained Molecular Dynamics

Vemuri, Sesha Hari, Chung, Pil Seung, Smith, Robert, Yeom, Geun-Young, Jhon, Young In, Lee, Nae-Eung, Biegler, Lorenz T., Jhon, Myung S.

Journal:

IEEE Transactions on Magnetics

Year:

2012

Language:

english

File:

PDF, 631 KB

english, 2012

22

Etching characteristics and mechanisms of Mo thin films in Cl 2 /Ar and CF 4 /Ar inductively coupled plasmas

Lim, Nomin, Efremov, Alexander, Yeom, Geun Young, Choi, Bok-Gil, Kwon, Kwang-Ho

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 936 KB

english, 2014

23

A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications

Chun, Inwoo, Efremov, Alexander, Yeom, Geun Young, Kwon, Kwang-Ho

Journal:

Thin Solid Films

Year:

2015

Language:

english

File:

PDF, 632 KB

english, 2015

24

Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas

Kim, Tae Hyung, Kim, Kyong Nam, Mishra, Anurag Kumar, Seo, Jin Seok, Jeong, Ho Boem, Bae, Jung Oun, Yeom, Geun Young

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 850 KB

english, 2013

25

Characteristics of pulsed dual frequency inductively coupled plasma

Seo, Jin Seok, Kim, Kyoung Nam, Kim, Ki Seok, Kim, Tae Hyung, Yeom, Geun Young

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 302 KB

english, 2015

26

Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns

Lee, Junmyung, Efremov, Alexander, Yeom, Geun Young, Lim, Nomin, Kwon, Kwang-Ho

Journal:

Journal of Nanoscience and Nanotechnology

Year:

2015

Language:

english

File:

PDF, 1.10 MB

english, 2015

27

Silicon Surface Modification Using C4F8+O2 Plasma for Nano-Imprint Lithography

Lee, Junmyung, Efremov, Alexander, Lee, Jaemin, Yeom, Geun Young, Kwon, Kwang-Ho

Journal:

Journal of Nanoscience and Nanotechnology

Year:

2015

Language:

english

File:

PDF, 634 KB

english, 2015

28

Recent Advances in Doping of Molybdenum Disulfide: Industrial Applications and Future Prospects

Pham, Viet Phuong, Yeom, Geun Young

Journal:

Advanced Materials

Year:

2016

Language:

english

File:

PDF, 17.28 MB

english, 2016

29

Highly oxidation-resistant silver nanowires by CxFy polymers using plasma treatment

Yang, Kyung Chae, Sung, Da In, Shin, Ye Ji, Yeom, Geun Young

Journal:

Year:

2019

Language:

english

File:

PDF, 2.35 MB

english, 2019

30

A Special Issue on Nanotechnology in Korea 2018

Kang, Dae Joon, Yeom, Geun-Young, Min, Kyeong-Sik

Journal:

Journal of Nanoscience and Nanotechnology

Year:

2019

Language:

english

File:

PDF, 41 KB

english, 2019

31

Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam

Kim, Doo San, Kim, Ju Eun, Lee, Won Oh, Park, Jin Woo, Gill, You Jung, Jeong, Byeong Hwa, Yeom, Geun Young

Journal:

Plasma Processes and Polymers

Year:

2019

Language:

english

File:

PDF, 2.25 MB

english, 2019

32

Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

Yang, Kyung Chae, Shin, Ye Ji, Tak, Hyun Woo, Lee, Wonseok, Lee, Seung Bae, Yeom, Geun Young

Journal:

Year:

2019

Language:

english

File:

PDF, 7.06 MB

english, 2019

33

Etch Damages of Ovonic Threshold Switch (OTS) Material by Halogen Gas Based-Inductively Coupled Plasmas

Park, Jin Woo, Kim, Doo San, Lee, Won Oh, Kim, Ju Eun, Choi, HyeJin, Kwon, OIk, Chung, SeungPil, Yeom, Geun Young

Journal:

ECS Journal of Solid State Science and Technology

Year:

2019

Language:

english

File:

PDF, 940 KB

english, 2019

34

[IEEE 2020 IEEE 70th Electronic Components and Technology Conference (ECTC) - Orlando, FL, USA (2020.6.3-2020.6.30)] 2020 IEEE 70th Electronic Components and Technology Conference (ECTC) - Characteristics of Plasma-activated Dielectric Film Surfaces for Direct Wafer Bonding

Son, Seongmin, Min, Junhong, Jung, Eunsuk, Kim, Hoechul, Kim, Taeyoung, Jeon, Hyungjun, Kim, Jinnam, Kim, Seokho, Moon, Kwangjin, Na, Hoonjoo, Hwang, Kihyun, Yeom, Geun Young

Year:

2020

File:

PDF, 1.51 MB

2020

35

Characteristic of carbon nanotubes synthesized by pin-to-plate type atmospheric pressure plasma enhanced chemical vapor deposition at low temperature

Yong-Hyuk Lee, Se-Jin Kyung, Chan-Woo Kim, Geun-Young Yeom

Journal:

Year:

2006

Language:

english

File:

PDF, 291 KB

english, 2006

36

Field emission properties of carbon nanotubes synthesized by capillary type atmospheric pressure plasma enhanced chemical vapor deposition at low temperature

Se-Jin Kyung, Yong-Hyuk Lee, Chan-woo Kim, June-Hee Lee, Geun-Young Yeom

Journal:

Year:

2006

Language:

english

File:

PDF, 376 KB

english, 2006

37

The effect of atmospheric pressure plasma treatment on the field emission characteristics of screen printed carbon nanotubes

Se-Jin Kyung, Jae-Beom Park, Maksym Voronko, June-Hee Lee, Geun-Young Yeom

Journal:

Year:

2007

Language:

english

File:

PDF, 1.12 MB

english, 2007

38

Improvement of electron field emission from carbon nanotubes by Ar neutral beam treatment

Se-Jin Kyung, Jae-Beom Park, Byung-Jae Park, June-Hee Lee, Geun-Young Yeom

Journal:

Year:

2008

Language:

english

File:

PDF, 585 KB

english, 2008

39

Oxide surface cleaning by an atmospheric pressure plasma

Chang Heon Yi, Chang Hyun Jeong, Yong Hyuk Lee, Young Wook Ko, Geun Young Yeom

Journal:

Surface and Coatings Technology

Year:

2004

Language:

english

File:

PDF, 126 KB

english, 2004

40

Characteristics of inductively coupled plasma with multiple U-type internal antenna for flat panel display applications

Kyong Nam Kim, Seung Jae Jung, Geun Young Yeom

Journal:

Surface and Coatings Technology

Year:

2005

Language:

english

File:

PDF, 215 KB

english, 2005

41

Etching characteristics of multiple U-type internal linear inductively coupled plasma for flat panel display

Seung Jae Jung, Kyong Nam Kim, Geun Young Yeom

Journal:

Surface and Coatings Technology

Year:

2005

Language:

english

File:

PDF, 173 KB

english, 2005

42

Effects of inductively coupled plasma treatment using O2, CF4, and CH4 on the characteristics of organic light emitting diodes

Chang Hyun Jeong, June Hee Lee, Jong Tae Lim, Mi Suk Kim, Geun Young Yeom

Journal:

Surface and Coatings Technology

Year:

2007

Language:

english

File:

PDF, 364 KB

english, 2007

43

Growth of carbon nanotubes by atmospheric pressure plasma enhanced chemical vapor deposition using NiCr catalyst

Se-Jin Kyung, Maksym Voronko, Yong-Hyuk Lee, Chan-Woo Kim, June-Hee Lee, Geun-Young Yeom

Journal:

Surface and Coatings Technology

Year:

2007

Language:

english

File:

PDF, 688 KB

english, 2007

44

High-speed etching of amorphous silicon using pin-to-plate dielectric barrier discharge

Se-Jin Kyung, Jae-Beom Park, Yong-Hyuk Lee, June-Hee Lee, Geun-Young Yeom

Journal:

Surface and Coatings Technology

Year:

2007

Language:

english

File:

PDF, 426 KB

english, 2007

45

Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam

Woong Sun Lim, Sang Duk Park, Byoung Jae Park, Geun Young Yeom

Journal:

Surface and Coatings Technology

Year:

2008

Language:

english

File:

PDF, 462 KB

english, 2008

46

Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field

Kyong Nam Kim, Jong Hyeuk Lim, Geun Young Yeom

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 423 KB

english, 2007

47

Investigation of the plasma uniformity in an internal linear antenna-type inductively coupled plasma source by applying dual frequency

Gwang Ho Gweon, Jong Hyeuk Lim, Kyong Nam Kim, Seung Pyo Hong, Tae Hong Min, Geun Young Yeom

Journal:

Year:

2010

Language:

english

File:

PDF, 352 KB

english, 2010

48

Characteristics of hydrogenated silicon thin film deposited by RF-PECVD using He–SiH4 mixture

In kyo Kim, Jong Hyeuk Lim, Geun Young Yeom

Journal:

Year:

2011

Language:

english

File:

PDF, 423 KB

english, 2011

49

Effect of O2 plasma treatment on the properties of SiO2 aerogel film

Hong-Ryul Kim, Hyung-Ho Park, Sang-Hoon Hyun, Geun-Young Yeom

Journal:

Thin Solid Films

Year:

1998

Language:

english

File:

PDF, 360 KB

english, 1998

50

A study of GaN etch mechanisms using inductively coupled Cl2/Ar plasmas

Hyeon-Soo Kim, Geun-Young Yeom, Jae-Won Lee, Tae-Il Kim

Journal:

Thin Solid Films

Year:

1999

Language:

english

File:

PDF, 370 KB

english, 1999